Nikon G-line & I-line Stepper with 2 inch loader
•This system exposes a 5 : 1 reduction of a reticle pattern on to a wafer through step-and –repeat operations. It automatically performs reticle positioning and exposure focusing.
•The system also automatically performs pattern registration using the laser step alignment system.
Schematic of wafer exposure using a mask
Mask in typical projection/reduction
lithography system
排气阀组
鏡鏡(Lens)(Lens)
Main body
烫印膜(1) Reduction projection optical system
调频器(2) Illumination optical system
(3) Auto focus system
(4) Reticle alignment system
自制路由器天线(5) Auto reticle blind system (6) Wafer global alignment system
(7) Step monitor alignment system
(8) Laser step alignment system (9) Interferometer unit
(10) X-Y stage
(11) Wafer table
(12) Wafer loader
(13) Reticle loader
Control Rack
(1) Stage controller
(2) Interferometer controller
(3) Wafer alignment controller
(4) Reticle controller
(5) Lens controller (including automatic laser compensator)
(6) Wafer loader controller(7) Power supply
(8) Reticle loader controller
(9) Mini computer system
超声波换能片(10) Operation Panel
dsp2812
(11) CRT
